Deposition Rate Characteristics in the Horizontal Epitaxial Reactor
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چکیده
منابع مشابه
High-rate and wide-area deposition of epitaxial Si films by mesoplasma chemical vapor deposition
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ژورنال
عنوان ژورنال: KAGAKU KOGAKU RONBUNSHU
سال: 1981
ISSN: 0386-216X,1349-9203
DOI: 10.1252/kakoronbunshu.7.621